Meaning
A physical model relates the speed of atomic movement to the concentration gradient existing within a specific material. Estimating with fickian diffusion assumes that the flow of atoms moves from high-density zones to low-density zones. The rate of this movement is dictated by a constant unique to the substances involved.
Applications in chip manufacturing focus on how impurities travel inside silicon during heat treatments.
Mass Transport
Distance traveled by ions is calculated as a function of the square root of elapsed time. For semiconductor dopants, fickian diffusion predicts the depth of the electrical junction after oven processing. Technicians adjust the time or temperature variables to hit precise depth targets.
Linear Coefficient
Resistance to movement remains stable as long as the material remains at a constant temperature. Calculating through fickian diffusion fails when the crystal structure of the silicon is damaged by radiation. The relationship is strictly local and ignores effects from outside magnetic fields.
Saturation Limit
Atoms stop shifting once the concentration levels reach equilibrium throughout the entire sample. Observations of fickian diffusion indicate that the gradient is the only driver of atomic flux in basic models. In modern microchips, multiple forces interfere with this simple linear behavior.