
Suppressing Kirkendall Void Nucleation in Electroplated Copper Printed Circuit Substrates
Maintaining low bath organic breakdown impurities and pre-solder thermal annealing suppresses Kirkendall void nucleation in electroplated copper substrates.

Maintaining low bath organic breakdown impurities and pre-solder thermal annealing suppresses Kirkendall void nucleation in electroplated copper substrates.

Suppressing Kirkendall voiding demands controlling substrate copper electroplating additives and microalloying solders to balance diffusion rates.

Microvoid nucleation at copper surface finish interfaces stems from electroplating bath impurity co-deposition accelerating solid-state vacancy condensation.
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